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1

Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions

A. Schiltz, J-F. Terpan, G. Amblard, P.J. Paniez

Journal:

Microelectronic Engineering

Year:

1997

Language:

english

File:

PDF, 299 KB

english, 1997

2

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - New approach to PEB mechanisms in novolac-DNQ resists: influence of physical and viscoelastic properties

Toublan, Olivier, Tarascon-Auriol, Regine G., Peloso, Helene, Prola, Alain, Paniez, Patrick J.

Year:

1997

Language:

english

File:

PDF, 334 KB

english, 1997

3

The novolak calibration method applied to the GPC analysis of the UV photoresists

Patrick Paniez, André Weill

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 598 KB

english, 1986

4

Acidity of lithographic materials: Characterization by colorimetric titration

P.J. Paniez, D.C. Demattei, M.J.M. Abadie

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 366 KB

english, 1992

5

Bottom anti-reflective coatings: Control of thermal processing

A. Schiltz, J-F. Terpan, S. Brun, P.J. Paniez

Journal:

Microelectronic Engineering

Year:

1996

Language:

english

File:

PDF, 286 KB

english, 1996

6

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2

Schwalm, Reinhold, Binder, H., Fischer, Thomas, Funhoff, Dirk J. H., Goethals, Anne-Marie, Grassmann, Andreas, Moritz, Holger, Paniez, Patrick J., Reuhman-Huisken, Marijan E., Vinet, Francoise, Dijkst

Year:

1994

Language:

english

File:

PDF, 547 KB

english, 1994

7

SPIE Proceedings [SPIE 26th European Mask and Lithography Conference - Grenoble, France (Monday 18 January 2010)] 26th European Mask and Lithography Conference - 193nm resist deprotection study from outgassing measurements by TD-GCMS/FID

Tiron, Raluca, Behringer, Uwe F.W., Maurer, Wilhelm, Derrough, Samir, Fontaine, Hervé, Cetre, Sylviane, Perret, Damien, Thackeray, James W., Paniez, Patrick

Year:

2010

Language:

english

File:

PDF, 423 KB

english, 2010

8

Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists

Yamachika, Mikio, Patterson, Kyle, Cho, Sungseo, Rager, Timo, Yamada, Shintaro, Byers, Jeffrey, Paniez, P. J., Mortini, B., Gally, S., Sassoulas, P-O., Willson, C. Grant

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

Language:

english

File:

PDF, 534 KB

english, 1999

9

Etude calorimétrique de la rétention de l'eau par les résines novolaques

A. Weill, P. Paniez, E. Dechenaux

Journal:

Macromolecular Materials and Engineering

Year:

1984

File:

PDF, 419 KB

1984

10

Cinétique de la diffusion de l'eau dans un film mince de photoresist

Franc̨ois Sebillote, André Weill, Patrick Paniez

Journal:

Macromolecular Chemistry and Physics

Year:

1985

File:

PDF, 199 KB

1985

11

Differential scanning calorimetry analysis of novolak-based photoresists

A. Weill, E. Dechenaux, P. Paniez

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 713 KB

english, 1986

12

Commercial dyes for novolak based multilayer systems

P. Paniez, G. Amblard

Journal:

Microelectronic Engineering

Year:

1986

Language:

english

File:

PDF, 345 KB

english, 1986

13

An improved bilayer PMGI(1) lithographic process

J.C. Guibert, M. Chevalier, P. Paniez, G. Amblard

Journal:

Microelectronic Engineering

Year:

1987

Language:

english

File:

PDF, 756 KB

english, 1987

14

Silylation of three component E-beam resists: application to shipley SAL 601

Thierry G. Vachette, Patrick J. Paniez, Michel Madore

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 399 KB

english, 1990

15

Free volume and relaxation effects in polymer layers: application to the spin coating and bake processes

P. Paniez, M. Pons, O. Joubert

Journal:

Microelectronic Engineering

Year:

1990

Language:

english

File:

PDF, 324 KB

english, 1990

16

The role of self diffusion in the dry development and plasma durability of polymers

P.J. Paniez, O.P. Joubert, M.J. Pons, J.C. Oberlin, T.G. Vachette, A.P. Weill, J.H. Pelletier, C. Fiori

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 312 KB

english, 1991

17

Proximity E-beam exposure in submicron patterns using a silylation process

Thierry G. Vachette, Patrick J. Paniez, Frederic Lalanne, Michel Madore

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 357 KB

english, 1991

18

Melt flow of the silylated areas during the desire process

A. Weill, O. Joubert, P. Paniez, F. Debaene, M. Pons, D. Sage

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 480 KB

english, 1993

19

In-situ determination of photoresist glass transition temperature by wafer curvature measurement techniques

A. Schiltz, P.J. Paniez

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 312 KB

english, 1995

20

Free volume effects in chemically amplified DUV positive resists

L. Pain, C. Le Cornec, C. Rosilio, P.J. Paniez

Journal:

Microelectronic Engineering

Year:

1996

Language:

english

File:

PDF, 348 KB

english, 1996

21

Application of contact angle measurements to lithographic processes

E. Fadda, C. Clarisse, P.J. Paniez

Journal:

Microelectronic Engineering

Year:

1996

Language:

english

File:

PDF, 350 KB

english, 1996

22

Properties and mutual interactions of various acrylate monomers used in 193 nm resists

P.J. Paniez, F. Perrier, M. Panabiere, B. Mortini, C. Rosilio

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 287 KB

english, 1999

23

Physical and chemical analysis of advanced interconnections using energy filtering transmission electron microscopy

R Pantel, J Torres, P Paniez, G Auvert

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 777 KB

english, 2000

24

Thermal flow properties of novolak polymers

P. Paniez, A. Schiltz, M.J. Bouzid, E. Dechenaux

Journal:

Microelectronic Engineering

Year:

1989

Language:

english

File:

PDF, 397 KB

english, 1989

25

Extensive thermal characterization of advanced resists by Modulated Temperature DSC (MT-DSC): Application to acrylate based 193 nm resists

P.J. Paniez, J-A. Guinot, B. Mortini, C. Rosilio

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 287 KB

english, 1998

26

Thermal conversion of ppv precursor: characterization at different stages of the process

Jany Wéry, Bertrand Dulieu, Mimouna Baïtoul, Patrick Paniez, Gérard Froyer, Serge Lefrant

Journal:

Synthetic Metals

Year:

1999

Language:

english

File:

PDF, 201 KB

english, 1999

27

Development of Polymers in $\bf O_{2}$ Plasmas: Temperature Effects and Transition to Imperfect Anisotropy

Pons, Michel, Pelletier, Jacques, OlivierJoubert,, Paniez, Patrick

Journal:

Japanese Journal of Applied Physics

Year:

1995

File:

PDF, 1.70 MB

1995

28

[IEEE Comput. Soc 22nd International Conference on Distributed Computing Systems Workshops - Vienna, Austria (2-5 July 2002)] Proceedings 22nd International Conference on Distributed Computing Systems Workshops - Superphony: towards ubiquitous audio communication services

Lacoste, M., Paniez, P., Vareille, A.

Year:

2002

Language:

english

File:

PDF, 243 KB

english, 2002

29

Ultraviolet induced transformation of polysiloxane films

Joubert, O., Hollinger, G., Fiori, C., Devine, R. A. B., Paniez, P., Pantel, R.

Journal:

Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 794 KB

english, 1991

30

Resist degradation under plasma exposure: Synergistic effects of ion bombardment

Joubert, O., Fiori, C., Oberlin, J. C., Paniez, P., Pelletier, J., Pons, M., Vachette, T., Weill, A.

Journal:

Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 857 KB

english, 1991

31

Polymer behavior under plasma etching: Influence of physical properties on kinetics and durability

Joubert, O., Paniez, P., Pons, M., Pelletier, J.

Journal:

Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 993 KB

english, 1991

32

Plasma etching of polymers: A reinvestigation of temperature effects

Pons, M., Joubert, O., Paniez, P., Pelletier, J.

Journal:

Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 800 KB

english, 1991

33

Etching of polymers by oxygen plasmas: Influence of viscoelastic properties

Joubert, O., Paniez, P., Pelletier, J., Pons, M.

Journal:

Applied Physics Letters

Year:

1991

Language:

english

File:

PDF, 546 KB

english, 1991

34

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Silylation and dry development of three component resists for half-micron lithography

Vachette, Thierry G., Paniez, Patrick J., Madore, Michel, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 1.05 MB

english, 1990

35

High cure rate with 24 weeks of daclatasvir-based quadruple therapy in treatment-experienced null-responder HIV/HCV genotype 1/4 co-infected patients: the ANRS HC 30 QUADRIH study

Piroth, L., Paniez, H., Taburet, A. M., Vincent, C., Rosenthal, E., Lacombe, K., Billaud, E., Rey, D., Zucman, D., Bailly, F., Bronowicki, J.-P., Simony, M., Diallo, A., Izopet, J., Aboulker, J.-P., M

Journal:

Clinical Infectious Diseases

Year:

2015

Language:

english

File:

PDF, 1.19 MB

english, 2015

36

Thermostable trilayer resist for niobium lift-off

P. Dubos, P. Charlat, T. Crozes, P. Paniez, B. Pannetier

Year:

2000

Language:

english

File:

PDF, 627 KB

english, 2000

37

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Study of bake mechanisms by real-time in-situ ellipsometry

Paniez, Patrick J., Vareille, Aime, Ballet, Patrice, Mortini, Benedicte P.

Year:

1998

Language:

english

File:

PDF, 494 KB

english, 1998

38

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Processing of acrylate-based 193-nm resists: influence of physico-chemical properties

Mortini, Benedicte P., Rosilio, Charles, Prola, Alain, Paniez, Patrick J.

Year:

1998

Language:

english

File:

PDF, 873 KB

english, 1998

39

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Undercut elimination in DUV negative systems: application to lithography and etching of metal levels

Vinet, Francoise, Heitzmann, Michel, Mourier, Thierry, Poncet, Dominique, Previtali, Bernard, Vizioz, C., Paniez, Patrick J., Schiltz, Andre, Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 519 KB

english, 1996

40

SPIE Proceedings [SPIE Hague International Symposium - The Hague, Netherlands (Monday 30 March 1987)] Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection - Characterization of commercial dyes for PMMA bilayer systems

Paniez, Patrick J., Amblard, Gilles R., Dechenaux, Elisabeth C., Weill, Andre P., Stover, Harry L., Wittekoek, Stefan

Year:

1987

Language:

english

File:

PDF, 6.57 MB

english, 1987

41

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Free volume variations during exposure and PEB of DUV positive resists: effect on dissolution properties

Pain, Laurent, Le Cornec, Charles, Rosilio, Charles, Paniez, Patrick J., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 228 KB

english, 1996

42

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Modulated-temperature DSC (MT-DSC): a new technique for the extensive thermal characterization of complex chemically amplified systems

Paniez, Patrick J., Brun, S., Derrough, S., Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 281 KB

english, 1997

43

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Dry development of silylated resist: influence of substrate temperature

Joubert, Olivier P., Rouyer, Claude, Pons, Michel J., Weill, Andre P., Paniez, Patrick J., Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 550 KB

english, 1992

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Continuous evolution of lithographic films through process steps: an example with 193 chemically amplified resists

Derrough, Samir, Allen, Robert D., Tiron, Raluca, Perret, Damien, Thackeray, James W., Sourd, Claire, Paniez, Patrick

Year:

2010

Language:

english

File:

PDF, 720 KB

english, 2010

45

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Role of surface tension in silylation processes

Weill, Andre P., Paniez, Patrick J., Joubert, Olivier P., Debaene, Francoise, Sage, Daniel, Amblard, Gilles R., Pons, Michel J., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 276 KB

english, 1993

46

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Physical aging of resists: the continual evolution of lithographic material

Paniez, Patrick J., Weill, Andre P., Cohendoz, Stephane D., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 393 KB

english, 1991

47

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Bake mechanisms in novolak-based photoresist films: investigation by contact angle measurements

Fadda, Emilienne, Clarisse, C., Paniez, Patrick J., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 230 KB

english, 1996

48

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Physical description of lithographic processes: correlation between bake conditions and photoresist contrast

Paniez, Patrick J., Festes, Gilles, Chollet, Jean-Paul E., Novembre, Anthony E.

Year:

1992

Language:

english

File:

PDF, 1013 KB

english, 1992

49

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Dry development and plasma durability of resists: melt viscosity and self-diffusion effects

Paniez, Patrick J., Joubert, Olivier P., Pons, Michel J., Oberlin, Jean C., Weill, Andre P., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 517 KB

english, 1991

50

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - In-situ monitoring of silylation mechanisms by laser interferometry

Pierrat, Christophe, Paniez, Patrick J., Martin, P., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 426 KB

english, 1991